OpticNano Consulting



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OPTICNANO Consulting

126,route de St Donat

  38250 Lans en Vercors-France

Phone +33(0)970 44 82 71

mobile: +33(0)688701450

e-mail: info@opticnano.eu

Skype: opticnano

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earthWelcome  to the  Ellipsometry / Polarimetry site

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With high capability polarimeters, such as the next generation of angle resolved polarimeters instruments, Polarimetry opens new fields of investigation for nanotechnologies materials as well as for gratings and photonics structures analysis: a program presentlydeveloped through a national consortium ANR08-NANO-020-03. With this instrumentation progress,simulation remains a key point to overpass as a challenge between future instruments. The theories for surfaces spectral power density (PSD) and the random coupled wave approximation (RCWA) in periodic structures are widely described in the literature. The implementation of some of these codes is described herefor surface analysis and lithography scatterometry structures: grating overlay or double patterning.
The  paper published from the    API2009 conf in Paris 2009...see herelogo-pdf

Scatterometry

GGratingScatterometry models for IC design CD data

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Here will be  Future developpments...

EuV Projects

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Thick SiO2 on silicon substrate sample  Ellipsometry data ( Experiments : SE UV Ellipsometer at LETI . (unpublished 2008)

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