Spectroscopic Ellipsometry (SE) can be used for structure change observations in thin, (less than 10nm) HfO2 layers deposited by p-MOCVD on silicon substrate. The absorption edge Eg and most of the critical point transitions in HfO2 are above 6 eV, which makes the extension to Deep UV SE (5 to 9 eV) very suitable. The layer thickness can be deduced from the visible transparency range (where k~0). As a contrary, in the UV, the weak penetration of light enables to use a direct inversion method for n and k. It is shown that when the HfO2 thickness decreases below 3 nm, the analytical Tauc-Lorentz (TL) or Cody Lorentz models are no more applicable. The phase mixture changes as function of thickness and deposition process temperature, deduced from SE correspond well to XRD and Angle Resolved (AR)-XPS spectroscopy observations. From the absorption spectra at 4.5 eV, defects such as oxygen vacancies can be observed, whereas O/Hf ratio is estimated from XPS spectra. Deep UV SE reveals differences in the dielectric function with orthorhombic/monoclinic phase mixtures essentially with peaks at 7.5 and 8.5 eV. Quantum confinement originated from the grain size of the films and the excitonic origin of the 6 eV feature is discussed. see article here..\r\n
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New In Situ Applications fields\r\n
\r\nhere are different pictures of recent and available ellipsometer systems watch the page instruments
\r\n\r\n\r\n\r\n\r\nThe Paul Drude Berlin Ellipsometry workshop\r\n\r\n\r\n\r\nThe poster presented at the API2009 conf in Paris 2009...see here \r\n\r\n\r\n\r\nInternal Leti Workshop (Leti 2000) Stressnet meeting\r\n\r\n\r\n\r\nSiO2 Conference in Trento (Italy) VUVEllipsometry\r\n\r\n\r\n\r\nMueller matrix Anisotropy (ICSE4 Stockholm 2006)\r\n\r\n\r\n\r\nFCMN09 Conf. NIST 2009\r\n\r\n\r\n
Beside the use of diffracted light from nanotechnology surfaces there is also A way to establish the linear polarization of reflected,scattered, and transmitting light from natural object,such as moon,stars,sky,clouds,ect Much more polarization information is available in the detected light Is it Wavelength or dependent? with a Circular or elliptic polarization ? Is the light source iitself polarized?. Polarization of light experiments in the laboratory are mu...
Worshop in Polarimetry and Ellipsometry see here
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In the preceding review, a consistent and general approach to solve numerically the problem of the propagation of light in anisotropic media was described. Let us introduce here the concept of a more general theory. The mathematician S.R. Cloude 1has given a new flair of the propagation of the electromagnetic wave and the scattering processes with the help of the Lie Group Theory. When speaking of the pr...
The Effective Medium Approximation, (EMA), theory validate the thin films optical metrology in most cases when considering surface roughness. A scaling condition exist between the light wavelengths as compared to thin films roughness. In earlier papers, D. Ramsey1 and later P.I.Rovira and R.W.Collins2 ,S.F. Nee3, had shown however that poly crystaline and textured films could ...
\r\nExhaustive studies in the literature detail the Mueller matrices properties through decomposition,optical entropy and depolarization formalism. It has been applied for many years in rather different fields. In radar polarimetry, mathematical basis of depolarizing systems, have been first developed. In the visible range ...
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Scatterometry models for IC design CD data
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Thick SiO2 on silicon substrate sample Ellipsometry data ( Experiments : SE UV Ellipsometer at LETI . (unpublished 2008)