OpticNano Consulting



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OPTICNANO Consulting

126,route de St Donat

  38250 Lans en Vercors-France

Phone +33(0)970 44 82 71

mobile: +33(0)688701450

e-mail: info@opticnano.eu

Skype: opticnano

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earthWelcome  to the  Ellipsometry / Polarimetry site

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OPTICNANO Consulting EURL

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Optical Metrology

 

Surface &  Thin Film Characterization

 Ellipsometry Polarimetry Optical Instruments  

OPTICAL METROLOGY & POLARIMETRY for  Micro and Nano-Technology.

A Scientific Consulting and Expertise Service offered to customers.

We propose developments  & technology monitoring using metrology optics  for various applications   using Specroscopic Ellipsometry and Polarimetry.
Assistance can be established through contracts within a NDA protocol. The corresponding  interface is then setup between R&D laboratories and  the customer when Optical characterization is requested especially for thin films stackings (ultra  thin layers,  new materials, nanotechnology in line and off line).
Projects receive expert attention within this research environment  .This a way to consolidate optical models adapted to last innovative optical instruments such as Spectroscopic Ellipsometry and Polarimetry. This is our way of excellence to deliver

 

 

    • Assistance in the selection of proposals made by suppliers of instruments best suited to the needs of metrology research.

 

    • Optimization of data acquisition  from instruments

 

    • Support while  mounting European or Regional  financial programs by considering the feasibility and the relevance of a scientific project

 

  • Parallel education & training: seminars application or General instrumentation optics and the  applications.\r\n

    Our References

    More than 50 publications in Ellipsometrie Polarimetrie
    International  recognition , still Reviewer in various scientific journals TSF1, JOSA2 EJAP3.
    Within NDA interactions to protect the customer , various  possible exchange with different groups at a global level in Ellipsometry and reflectometry and Polarimetry: particularly with instrument suppliers  KLA Tencor, j. Woollam, Horiba Scientific and SemiLab Sopra.


      • Participation in various industrial instrumentation projects (first spectroscopic ellipsometers in visible, infrared and extreme ultraviolet  ranges in France)
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      • Knowledge within NDA interactions with different groups at the global level Ellipsometrie and reflectometry Polarimetry: KLA Tencor, j. Woollam, Horiba Scientific and SemiLab Sopra


    We have SKILLS for


      • Nanotechnology measurement  ex and in situ processing for new materials  with simulation programs
      • New Multi layers stackings and surface properties studies
      • Polarimetrie Photonic Structures and lithography
    Adsorption of surface porosimetrie studies.

Toward the Design of a new all  integrated,  imaging Spectroscopic Polarimetric Ellipso Microscope,(SPEM).

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General state of art has been well developed these last decades in the SE Ellipso Polarimetry field. More than thirty years transformed this old technique into powerful tool but still R&D fashion even as big embodied and only mostly dedicated tools. Ellipsometry apparatus systems are indeed present in clean room environment and many industrial fields New SE Ellipso polarimeter designs are proposed today with complete full Muller matrix capability. The project should plan to build a compact and an integrated low cost system that can be realized using new integrated technology and implemented inside a regular optical microscope.Integrated structures with no movables parts assemblies enhance stability and repeatability of any optical instrument. For SPEM, that should lead to a large dedicated application dissemination. With present remote computing capabilities, polarimetric Spectroscopic Ellipsometer (SE) , it is possible to process real time optical data using the new technologies concepts available today. Full integrated polarimeter designs are already partly discussed in the literature. In such a project, more global solutions have to be considered i. e., a microscope polarimeter design including both spectroscopic capability (sp-polarimetry), angle resolved polarimetry (ar-polarimetry), and reduced spot size analysis capability for imaging, (i-polarimetry).It is worth them to reconsider all the assembly of such systems and how it has to be implemented in an integrated metrology concept: As light sources, various options can be adopted, laser, LED, or lamp source Kohler illumination systems

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Spectroscopic Ellipsometry at higher Vacuum Ultraviolet (V-UV) photons energies.

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Metrology within the knowledge of the building of a Spectro-ellipsometer in the vacuum ultraviolet(V-UV)8-30 eV Photons Range commercial instrument.Concern the general state of art currently achieved in SE Polarimetry and VUV metrology fields. This project should consist in the build of an instrument incorporating a V-UV source capability without the need of the synchrotron line facilities
Concerned Fields : Microelectronic and Nanotechnologies, more generally as a tool for studying new materials physics,ultra thin layers, roughness depolarization and for optical surface inspection control.
Material properties already explored and reported,yield wealthy information: in their internal inner band structure of elements, extra thin layered materials, phase transitions,oxide gap absorption properties, distinction following configuration in nitroxides [5], etc. ). Complementary to two additional techniques as well, but deeply heavy, destructive and delicate to operate such as Photoemission (25-500ev) and energy electron loss spectroscopy (EELS) (10-50ev). :
 At the present time, metrology needs using Spectroscopic Ellipsometry technique are to be extended to the far Ultraviolet range. The reasons and interests rely in the design and the developments of the advanced integrated circuit (IC) technologies,new materials and nanotechnology design.

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Here will be  Future developpments...

EuV Projects

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Thick SiO2 on silicon substrate sample  Ellipsometry data ( Experiments : SE UV Ellipsometer at LETI . (unpublished 2008)

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