OpticNano Consulting

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OPTICNANO Consulting

126,route de St Donat

  38250 Lans en Vercors-France

Phone +33(0)970 44 82 71

mobile: +33(0)688701450

e-mail: info@opticnano.eu

Skype: opticnano

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earthWelcome  to the  Ellipsometry / Polarimetry site



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Spectroscopic Ellipsometry and Polarimetry

Have a question? Within soon  and many  potential  members, the OMSP Discussion Forums at the nanocharm logoNanocharm European Community that are a great resource for both new and experienced users . Ask your toughest questions these  communities ,e.g. see also here which are waiting to see what you are expecting  in term of Optical metrology. Do you want to show off your new OMSP Web site? Visit the main section of the Site forum. But if you feel that too much information given would be unfortunate for your industry, Do you want to contribute?, we setup initially non disclosure agreement (NDA). Wait until you start working on it. We're passionate about yourself as helping other users becoming  contributors but certainly keep frontiers between general techniques approaches and your specific interest.


EuV projects for future..

Spectroscopic Ellipsometry at higher Vacuum Ultraviolet (V-UV) photons energies.


Metrology within the knowledge of the building of a Spectro-ellipsometer in the vacuum ultraviolet(V-UV)8-30 eV Photons Range commercial instrument.Concern the general state of art currently achieved in SE Polarimetry and VUV metrology fields. This project should consist in the build of an instrument incorporating a V-UV source capability without the need of the synchrotron line facilities
Concerned Fields : Microelectronic and Nanotechnologies, more generally as a tool for studying new materials physics,ultra thin layers, roughness depolarization and for optical surface inspection control.
Material properties already explored and reported,yield wealthy information: in their internal inner band structure of elements, extra thin layered materials, phase transitions,oxide gap absorption properties, distinction following configuration in nitroxides [5], etc. ). Complementary to two additional techniques as well, but deeply heavy, destructive and delicate to operate such as Photoemission (25-500ev) and energy electron loss spectroscopy (EELS) (10-50ev). :
 At the present time, metrology needs using Spectroscopic Ellipsometry technique are to be extended to the far Ultraviolet range. The reasons and interests rely in the design and the developments of the advanced integrated circuit (IC) technologies,new materials and nanotechnology design.


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GGratingScatterometry models for IC design CD data

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Here will be  Future developpments...

EuV Projects


Thick SiO2 on silicon substrate sample  Ellipsometry data ( Experiments : SE UV Ellipsometer at LETI . (unpublished 2008)


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