The new Band Wavelength Ellipsometer (BWE) excels at measuring the thickness and index of transparent single films, in the thickness range from 0 to 1000 nm. Measurements on semitransparent and absorbing films, and 2 - 3 layer films are also possible.
Semiconductor: oxides and nitrides, high/low k dielectrics, amorphous and poly Si, photoresists Optical Coatings: high and low index films a-Si films, organic films (for OLED technology)
Data Storage industry: DLC films.Process R&D: in situ characterization of film deposition, for MBE, CVD,ALD, sputtering,
Chemistry and Biology: detection of sub-monolayer material adsorption in-line monitoring and controlIndustrial
Compact, light weight Can be installed without breaking chamber vacuum for
Realtime monitoring and control of film thickness
Study growth dynamics, nucleation, interfaces Characterize Dep. Rates vs. process parameters in a single 0 50 100 150 200 250 300 350 400 run, without breaking vacuum!. For Europe Quotes and Documentation , information
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