Both optical and X-ray related techniques have gained considerable interest in the last decade and are currently involved in the characterization of thin film materials and nanomaterials. In this symposium, these methods will be discussed with particular attention paid to their application, as well as their limitations and complementarities.
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Current trends in optical and X-ray metrology of advanced materials for nanoscale devices IV This E-MRS symposium is aimed to: The current trends in optical metrology mainly concern spectroscopic ellipsometry (SE), polarisation and modulation...\r\n