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Polarimetry of Surfaces (1)


The MProbe20
choice for another thickness range...




 The MProbe 20 series is a desktop system for thin-film thickness measurement. The measurement is based on spectroscopic reflectance and uses fiber optics retro-reflecting probe. This approach yields a compact, easy to use and affordable system.The system is user friendly and easy to setup – you will be ready to start measurements right away. Everything is included for samples measurement: spectrometer/ light source (main unit), fiber optics probe, sample stage, software, calibration/reference sample.Our extensive materials library has 500+ materials. New materials can be easily imported or created/added to the library. Support for a wide range of parameterized materials (from Cauchy to Tauc-Lorentz, etc.) is included.One-click measurement combines data acquisition and data analysis. Everybody is a measurement expert with MProbe!For advanced users, we have all the sophisticated tools including sensitivity analysis, error-estimator, simulation, filmstack switching, global optimization, layers and materials linking, etc. that can be used for advanced applications development.Reflectance and transmittance spectral data can also be used as a raw measurement (for example, as in spectrophotometer) or a for a wide range of other applications e.g. chemical concentration (we have a range of flow cells), filters and coating testing, etc.

Why use MProbe

Flexible: select the best hardware configuration for your application

Affordable: up to 50% savings as compared to other commercial instruments

Precision: unmatched precision <0.01nm or 0.01%

Materials database: extended database (500+ materials) is included

Software: flexible, user friendly and powerful software; integrated control/data acquisition and data analysis; any filmstack: no limits on number of layers, support inhomogeneous and thick incoherent layers, surface roughness, multi-sample analysis, etc.

Integration: several integration options are available: Modbus TCP, OPC (DA 2.0/3.0), custom options

Technical support: application and technical support

Practically any translucent or low-absorbing film can be measured: SiO2, SiNx, DLC, Photoresist, Polymer, Polyamide, polySi, nanocrystalline Si, aSi, Si, Parylene, industrial coatings.

1nm-1000µm thickness range

Thin-film solar cells: aSi, CIGS, CdT, TCO

Semiconductor and dielectric materials (Photoresist, oxides, nitrides, OLED stack)

Optical coatings (Anti-Reflection, Hard coatings, Filters)

Liquid Crystal displays (Cell Gaps, ITO, Polyamides)

Magnetic media, laser mirrors, thin metal films





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SNOWRAY: A very nice step into future for industry quality control
From what we learned before...
Even though being far away...
Meta materials.. Polarimetry Mueller matrices Surface Analysis but what else??
e.g. with the Film Sense powerfull Instrument ... the RT300 from Film Sense 60seconds for only 49 points
or slower with other systems...
classical Mapping obtained with XY SE Mapping...2D acquisition takes a very long time isn't? Even with only 49 points
with 3D results SNOWRAY looks like that : Immediate picture!!! .If you get many data...
Is that a new way? ...Let's consider Plank 's law and Material Emissivity
Irradiated multi layers sample gives a unique signature
In the Infra Red related to respective material nature and respective layers stacks thicknesses
the IR Emissivity versus thickness can be thus calibrated.....provide then absolute thickness values..
with the SNOWRAY technique .. that's what we get
another wafer patented mapping technique
instantaneous measurement.compareto classical XY mapping..!!
A deep into wafer structure
with powerfull analysis since..for one detail..
One can focus on specific 3D defects detected ...
when setup with In situ Ellipsometer with very fast acquisition rate (10ms)...
Collaboration in Beta sites is opened worlwide ...
A new instrument a full real time thickness calibration .

IR Basics Emissivity Instruments

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