From what we learned before...
Even though being far away...
Meta materials.. Polarimetry Mueller matrices Surface Analysis but what else??
e.g. with the Film Sense powerfull Instrument ... the RT300 from Film Sense 60seconds for only 49 points
or slower with other systems...
classical Mapping obtained with XY SE Mapping...2D acquisition takes a very long time isn't? Even with only 49 points
with 3D results SNOWRAY looks like that : Immediate picture!!! .If you get many data...
Is that a new way? ...Let's consider Plank 's law and Material Emissivity
In the Infra Red related to respective material nature and respective layers stacks thicknesses
with the SNOWRAY technique .. that's what we get
another wafer patented mapping technique
A deep into wafer structure
when setup with In situ Ellipsometer with very fast acquisition rate (10ms)...
which provides an absolute real time calibration ...
Collaboration in Beta sites is opened worlwide ...
A new instrument a full real time thickness calibration .
Ag layer model (Francoeur et al 2013 JRT 75-85.)
and what can be evaluated....

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Polarimetry of Surfaces (1)

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SNOWRAY
SNOWRAY: A very nice step into future for industry quality control
From what we learned before...
Even though being far away...
Meta materials.. Polarimetry Mueller matrices Surface Analysis but what else??
e.g. with the Film Sense powerfull Instrument ... the RT300 from Film Sense 60seconds for only 49 points
or slower with other systems...
classical Mapping obtained with XY SE Mapping...2D acquisition takes a very long time isn't? Even with only 49 points
with 3D results SNOWRAY looks like that : Immediate picture!!! .If you get many data...
Is that a new way? ...Let's consider Plank 's law and Material Emissivity
Irradiated multi layers sample gives a unique signature
In the Infra Red related to respective material nature and respective layers stacks thicknesses
the IR Emissivity versus thickness can be thus calibrated.....provide then absolute thickness values..
with the SNOWRAY technique .. that's what we get
another wafer patented mapping technique
instantaneous measurement.compareto classical XY mapping..!!
A deep into wafer structure
with powerfull analysis since..for one detail..
One can focus on specific 3D defects detected ...
when setup with In situ Ellipsometer with very fast acquisition rate (10ms)...
Collaboration in Beta sites is opened worlwide ...
A new instrument a full real time thickness calibration .

SNOWRAY

 
High-accuracy Spectral Emissivity Measurement
for Industrial and Remote Sensing Applications.
 
 Wuppertal University (web source)dc1604 2020 08 07 16.02 02
 
 Dr. rer. nat. genehmigte
Dissertation vorgelegt von Albert Adibekyan aus Moskau Gutachter: Univ.
 
-Prof. Dr. Ralf Koppmann Dr. Jörg Hollandt Wuppertal
 
Fakultät Mathematik und Naturwissenschaften Fachgruppe Physik der Bergischen Universität Wuppertal zur Erlangung des akademischen
2016.
 
 
 
Abstract
The unique potential of radiation thermometry for temperature measurements ranging from non-contact temperature control of numerous industrial production processes to climate research by remote sensing of the Earth requires the accurate knowledge of the radiation properties of a material, i.e. its spectral emissivity. A variety of techniques for the emissivity measurements are available but in many cases they do not meet the wide range of requirements posed by modern science and industry and do not provide sufficiently accurate results with reliable uncertainty values.
Read more: THERMAL EMISSIVITY
Basics of Infrared Thermometry
eXTRACTED FROM optris dOCUMENTATION)
 
Depending on the temperature each object emits a certain amount of infrared radiation. A change in the temperature of the object is accompanied by a change in the intensity of the radiation. Searching for new optical material William Herschel by chance found the infrared radiation in 1800.
.
earth.gif
 
Figure 40: William Herschel (1738-1822).
He blackened the peak of a sensitive mercury thermometer. This thermometer, a glass prism that led sun rays onto a table made his measuring arrangement. With this, he tested the heating of different colors of the spectrum. Slowly moving the peak of the blackened thermometer through the colors of the spectrum, he  noticed the increasing temperature from violet to red. The temperature rose even more in the area behind the red end of the spectrum. Finally he found the maximum temperature far behind the red area. Nowadays this area is called “infrared wavelength area”.
 
 
OPTRIS 2020 08 05 15.49 03
Figure 41: The electromagnetic spectrum and the area used for temperature measurement
 
 
Read more: Thermography
 
 
 
EPJCPonçot PTsFrance2014fr
  logo pdf
 
 
 
 EP 2 957 857 A2
(12) DEMANDE DE BREVET EUROPEEN
(43) Date de publication:
23.12.2015 Bulletin 2015/52
(21) Numéro de dépôt: 15172151.1
(22) Date de dépôt: 15.06.2015
(51) Int Cl.:
G01B 11/06 (2006.01) G01B 21/08 (2006.01)
(84) Etats contractants désignés:
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB
GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO
PL PT RO RS SE SI SK SM TR
Etats d’extension désignés:
BA ME
Etats de validation désignés:
MA: 19.06.2014 FR 1455650
) Demandeur: Ponçot, Jan-Claude
25000 Besancon (FR)
(72) Inventeur: PONÇOT, Jean-Claude
25000 BESANÇON (FR)
 DISPOSITIF DE MESURE D’UN ENSEMBLE DE DONNEES SPATIALES D’EPAISSEUR D(X,Y)
D’UNE COUCHE MINCE ET PROCEDE DE MESURE UTILISANT LEDIT DISPOSITIF
(57) L’invention a pour objet un dispositif de mesure
d’un ensemble de données spatiales d’épaisseur d(x,y)
d’une couche mince comprise dans un ensemble de couche(

EP 2 957 857 A2
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